Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.
High Dielectric Constant Materials VLSI MOSFET Applications 1st Edition
Author(s): Howard Huff; ‎David Gilmer
Publisher: Springer
ISBN: 9783540210818
Edition: 1st Edition
$39,99
Delivery: This can be downloaded Immediately after purchasing.
Version: Only PDF Version.
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