Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.
LOW TEMP EPITAXIAL GROWTH OF SEMICONDUCT
Author(s): Takahashi Hariu
Publisher: World Scientific
ISBN: 9789971508395
Edition:
$39,99
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Version: Only PDF Version.
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